Pos Mode facilitates positional editing beyond simple left/right control. The X/Y grid includes a single location point that governs a number of Early Reflection parameters (Diffusion, Complex, Spread and LF Cut), the Late Reverb Filters (LF Cut, HF Cut and Damp), overall Output Level, Wet/Dry balance and Left/Right Pan. With the exception of the Pan control, all of these parameters follow the vertical axis, and all but Pan and Wet/Dry balance can be activated individually, giving very flexible control. Every parameter has lower and upper limit settings that determine the extent to which they’re influenced by movement of the location point, and there are seven visually assistive backgrounds included, the most useful of which maps the standard layout for an Orchestra.
Even more handy than that, though, is that multiple…
